論文雑誌「ACS Applied Polymer Materials」のカバーピクチャーを制作しました［広島大学］
弊社で制作しました広島大学 濱田 崇 先生のカバーアートが
アメリカ化学会発行の学術雑誌 ACS Applied Polymer Materials
2021年 7月号に選ばれました。
Client
広島大学
先進理工系科学研究科
濱田 崇 先生
先進理工系科学研究科
濱田 崇 先生
Journal
ACS Applied Polymer Materials
July 9, 2021, Volume 3, Issue 7 Link
July 9, 2021, Volume 3, Issue 7 Link
Thermal Insulating Property of Silsesquioxane Hybrid Film Induced by Intramolecular Void Spaces
Takashi Hamada*, Yuki Nakanishi, Kenta Okada, Satoru Tsukada, Akira Uedono, and Joji Ohshita*
The hybrid film was prepared by the hydrosilylation reaction of hydrodimethyl-silylated oligomethylsilsesquioxane and octavinyl polyhedral oligomeric silsesquioxane (POSS). By the formation of intramolecular void spaces around POSS molecules, the hybrid film exhibited lower density and thermal diffusivity than the polymethylsilsesquioxane film. POSS molecules also enhanced the hardness of the hybrid film.
Link
Takashi Hamada*, Yuki Nakanishi, Kenta Okada, Satoru Tsukada, Akira Uedono, and Joji Ohshita*
The hybrid film was prepared by the hydrosilylation reaction of hydrodimethyl-silylated oligomethylsilsesquioxane and octavinyl polyhedral oligomeric silsesquioxane (POSS). By the formation of intramolecular void spaces around POSS molecules, the hybrid film exhibited lower density and thermal diffusivity than the polymethylsilsesquioxane film. POSS molecules also enhanced the hardness of the hybrid film.
Link
